To MEMS group:


I am getting troubles on sol-gel processing of PZT.
The substrate is magnetron-sputtered Pt/Ti/SiO2/Si(100), 1x1 inch^2.
The solution is 10wt%PZT(110/40/60) with 2-metoxiethanol filtered by
0.2um.
Spin coat @3000rpm for 30 sec. Imidiately followed by hot-plate drying
@350C for 10 min. 5 layers are coated.
Annealed @650C for 1 hour in Oxygen with heating rate of 3 deg/min.

<1st problem>
Even at the first layer spined, there are many pin-holes. This is
big problem!
<2nd problem>
After annealing, the film is sometimes pealing off at Ti/SiO2 interface.

I am looking for crack-free, pin hole-free PZT film.

Any suggestion would be helpful?

Thanks,

mori


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Kiyotaka Mori (Graduate Student)

Dept.of Materials and Nuclear Engineering,
BLDG.090,
University of Maryland at College Park,
College Park, MD 20742
Tel: 301-405-5229
Fax: 301-314-9467
E-mail: mori@eng.umd.edu
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