i have some problems with the deposition phase of the SU-8 5 on silicon
wafer. In particular i never be able to do it without give rise to
BUBBLES. Iven if they not seem to be present in this phase they appeare
just before the spinning, with also some strips of air. In the pre-bake
step they increase in dimensions with explosion of some of them. In the
best performance reached the photoresist surface is rough and irregular.
Can you give me some suggestions to resolve this problems or the name
and e-mail address of someone which can i ask for ?
Please send me an answer!
Thanks Vanessa la Cecilia
e-mail: vanessa.lacecilia@aquila.infn.it or alaceci@tin.it
tel.n. : +393388424257