Tiziana Lepidi wrote:

> i have problems with SU-8 photoresist. in particular i don't have idea
> to spin the photoresist on the silicon subtrate without form bubbles. Do
> you Know how to apply this photoresist avoiding this problem and have a
> uniform layer of photoresist?
> Thanks Vanessa la Cecilia
> Dr. Vanessa la Cecilia
> e-mail: vanessa.lacecilia@aquila.infn.it  or alaceci@tin.it
> tel. +393388424257
>
>

Dear Dr. Cecilia,

I have the same problem as yours. Furthermore, sometimes I got several
basin
area instead of bubbles.
Could you share the information with me once you get the answers?
Thank you!

Sincerely,

Bernard Hao-Chih Liu
Rapid Prototyping Lab
Stanford University
www-rpl.stanford.edu