Dr. la Cecilia,

We have found that great care must be taken to avoid bubbles when pouring or
using a syringe to dispense the SU-8 photoresist. Dispensing the resist
using a high viscosity resist pump is the best way to avoid bubbles and to
get a repeatable volume of SU-8. However, it is possible, using significant
care, to pour the resist directly from the bottle with good results. If you
are using a syringe, it is possible that the bubbles are being formed when
you draw the resist into the syringe.

We will send you an Electronic Visions application note which we have
written on the processing of SU-8, which will provide guidelines for a good
process for uniform coating.

Sincerely,

Cory Wajda

Cory Wajda
Staff Engineer
Electronic Visions, Inc.
e-mail  info@elvisions.com 
web     http://www.elvisions.com 
Ph.     602 437 9492 x 120
Fax     602 437 9435

                -----Original Message-----
                From:   Tiziana Lepidi
[mailto:lepidit@axscaq.aquila.infn.it]
                Sent:   Friday, October 08, 1999 2:52 AM
                To:     MEMS@ISI.EDU
                Subject:        SU-8 photoresist

                i have problems with SU-8 photoresist. in particular i don't
have idea
                to spin the photoresist on the silicon subtrate without form
bubbles. Do
                you Know how to apply this photoresist avoiding this problem
and have a
                uniform layer of photoresist?
                Thanks Vanessa la Cecilia
                Dr. Vanessa la Cecilia
                e-mail: vanessa.lacecilia@aquila.infn.it  or alaceci@tin.it
                tel. +393388424257