Electrochemical etching of Si in HF will produce such a surface, depends on
the current density, sliicondoping level and HF concentration.
Pavel

> ----------
> From:         Armin.Kuebelbeck@merck.de[SMTP:Armin.Kuebelbeck@merck.de]
> Reply To:     Armin.Kuebelbeck@merck.de;mems-cc@ISI.EDU
> Sent:         Tuesday, December 15, 1998 11:46 PM
> To:   MEMS@ISI.EDU
> Subject:      isotropic rough etch
>
> Dear Colleagues,
>
> Does anybody know an acidic (=isotropic!) etchant for silicon, which
> results in a rough etched silicon surface? Best would be deep holes with
> high aspect ratios. I heard about some special HNA (HF+HNO3+Acetic Acid)
> mixtures. Does anyone know the mixing ratios?
>
> Best regards
>
> Armin Kuebelbeck
> MERCK KGaA
> 64625 Darmstadt
> armin.kuebelbeck@merck.de
>
>
>
>