Dec. 13, 1995

In a given thin layer of a dielectric, such as silicon dioxide or silicon
nitride, I need to create a pattern of different indicies of refraction. I
thought it might be possible to do this by implanting, by one way or another,
various amounts of some material into the dielectric. I would like to be able
to create many different indicies of refraction at the same time, so I thought
it may be possible to gray-scale mask the implantation process by creating
various thicknesses of photoresist or some other material.

Does anyone have any experience with this? What materials should I be using for
the dielectric, implant and mask? How should I be performing the implantation?

Thank you.

Steve Morton
Oxford Computer, Inc.
Oxford, CT
tel 203-881-0891, fax 203-888-1146, smorton@oxfordcomputer.com