durusmail: mems-talk: New approach for MEMS process planning.
New approach for MEMS process planning.
1999-12-03
New approach for MEMS process planning.
Sungwook Cho
1999-12-03
Hi All,

I have developed a new methodolgy for MEMS process planning. It is a method
which automatically
generates fabrication sequences for surface micromachined structures with three-
dimensional
geometrical description(geometry-based system).

The new system decomposes a imported 3-D geometric object into three-dimensional
compatible geometry
for one process cycle for MEMS (ex. deposition-masking-etching) and groups them
for optimal layer
generation. Then, it generates fabrication order and mask data for each layers.

In that it generate process plan from whole 3D MEMS structure,
this approach is a unique approach compared with most of existing CAD systems
for MEMS (MEMCAD, MEMS Pro, Intellisense, etc.), I think.

Though there are a few similar systems similar whose concepts are similar with
mine,
they commonly handle only two-dimensional geometry data.

In my opinion, this approach for MEMS process planning can be expected
to breakthrough the limitations comming from the conventional process planning
system of MEMS, because many complex structures and compound MEMS
have been developed now.

Moreover, In future, CAD systems for 'MEMS synthesis(ex. system-on-chip)'
which starts from 3-D model will be develpoed. Thus, this new process planning
system could play an important role in the whole system.

What do you think about this new approach for the development
of MEMS process planning system?
Any opinions, advices, and information would be appreciated.
I look forward to hearing from you soon.

Thanks in advance.


Sincerely,
Sungwook Cho.


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