It may help, as SU-8 does seem to resist HF fairly well, but when the etch
is over, SU-8 is very difficult to remove, unlike normal pr.



>Hi,
>
>I am interested in etching about 7 microns of phosphosilicate glass
>deposited on silicon substrate. I am running into undercut problems due to
>erosion of the photoresist. Does anyone know if the SU-8 photoresist will
>help solve my problem.
>
>Thanks,
>Chelly
>

Greg Cibuzar, PhD                    (612) 625-8079
Laboratory Manager                   (612) 625-5012 fax
Microtechnology Laboratory
University of Minnesota
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