Dear Martin (and all at mems edg) I am looking for membranes that are 2mm in dia with silicon nitride membranes of 1 to 2um or preferably a bit thicker at 10um of Si. The membrane material is not that important, so long as it is circular and has low damping for use in a travelling wave piezomotor. The circularity should be fairly good. However, i am considering using a compensated KOH etch, as Gleb Vdovin of Delft did to make 10mm mirrors - this would need some testing and will be quasi circular. Many thanks to everyone who has replied, I will pass the ideas on if anyone else is interested later. Phil Rayner On 2 Feb 99, at 10:42, martin.walker@oxinst.co.uk wrote: From: martin.walker@oxinst.co.uk Date sent: Tue, 2 Feb 1999 10:42:29 +0000 To: p.j.rayner@cranfield.ac.uk Copies to: mems-cc@ISI.EDU > Hi > > Can you give us a bit more information? What size of membrane is required > (thickness, diameter)? Do you mean that you are using silicon as the > support material? There were some papers a while back in the Journal of > Micromechanics and Microengineering about silicon nitride membranes. As I > recall, these were produced by PECVD of nitride on both sides of a silicon > wafer, followed by patterning of the nitride on one side, which was then > used as a mask for KOH etching of the silicon. The resultant membranes were > used in experiments on direct-write e-beam patterning, using very high > acceleration voltages (~400KeV). The membranes were sufficiently thin to > avoid any back-scattering of the electrons. This work was done by Prof. > Broers and co-workers at Cambridge University Engineering Department. > > Hope this helps. > > Martin Walker > *********************************************** > Plasma Technology, Oxford Instruments > North End, Yatton > Bristol, BS49 4AP, England > Tel: +44 (0)1934 833851 Fax: +44 (0)1934 834918 > URL http://www.oxfordplasma.com/ > ***********************************************