Jerry:

If you are considering to generate sub-micron or few micron wide channels on
glass substrates have you thought about using FIB's. One can obtain very
high aspect ratio (1:100) and high precision channels (smallest channels
width that can obtained is 7 nm) using this technique. We at Norsam
Technologies are currently working on refining this technique. Let me know
if you need more information on this technique. Thank you and you can reach
me at 503-640-0586.

Regards
Jayant
******************************************************************
Jayant Neogi
Vice President & Chief Technical Officer
Norsam Technologies
Ph#  (503) 640-0586
Fax# (503) 640-8117
******************************************************************

-----Original Message-----
From: Jia-Hong Lee 
To: MEMS@ISI.EDU 
Date: Tuesday, February 23, 1999 2:12 PM
Subject: Etching Mask for BSG(Corning 7740)?


>
>hi, Everybody:
> I am trying to etch microchannel on glass (borosilicate glass,7740),
>but, lack of the support to do LPCVD poly-silicon on glass, the only
subsitution
>I know is Cr/Au, but I really don't know if it can resist deept etching for
me,
>about 320 mu m...
> Besides, I don't know if amorphous silicon can resist to HF etching,
>I want to do deep etching, so I will use HF about 48% solution...
> Any suggestions will be granted! I will appreciate..
>
> Thanks a lot,
> Sincerely
>
>Jerry Lee
>Insitute of Applied Mechanics
>email: r6543023@gauss.iam.ntu.edu.tw / iamjhlee@email.com
>
>
>