Chen:

Currently we are generating sub-micron grating with very high aspect ratio
for Los Alamos Lab using some of the proprietary technique that we have
developed at Norsam Technologies. We are publishing two papers on this topic
in HARMST Conference in Japan 13-15th June,1999 and SPIE Conference. Our
technique is going to be a commercial technique to generate sub-20nm grating
with 1:25 aspect ratios features with 150nm periodicity in metals. If you
have any more questions on this issue please feel free to contact me. Thank
you.

Regards
Jayant
******************************************************************
Jayant Neogi
Vice President & Chief Technical Officer
Norsam Technologies
Ph#  (503) 640-0586
Fax# (503) 640-8117
******************************************************************

-----Original Message-----
From: Hua-Tang Chen 
To: MEMS@ISI.EDU 
Date: Tuesday, March 02, 1999 5:21 PM
Subject: Grating mask


>Hi,
>    This is my first message in the group discussion.  How's everybody?
>
>I have some questions about the grating mask, which is a mask whose
>pattern is containing at least 10,000 lines/mm.
>Does anyone have information about who can fabricate this kind of mask?
>What is the highest frequency can be made and how much does it cost?  Is
>it possible to have cross lines or circular dots instead?
>Thank you for your information.
>
>
>Hua-Tang Chen
>chenhuat@egr.msu.edu
>3536 Engineering Building
>Dept. of Materials Science and Mechanics
>College of Engineering
>Michigan State University
>East Lansing, MI 48824
>
>
>