For such deep etching, you might still need to use the poly as your mask
material.  Cr/Au will likely be peeled off due to too much undercuting.

Good luck,
Chialun
---------------------------------------------
Chia-Lun Tsai, Ph.D.
   Research Scientist
   Integrated Sensing Systems, Inc.
   387 Airport Industrial Dr.
   Ypsilanti, MI 48198
   Phone: (734) 547-9896, Ext.115
   Fax: (734) 547-9964
   Email: chialun@mems-issys.com
   http://www.mems-issys.com/



-----Original Message-----
From: Jia-Hong Lee 
To: MEMS@ISI.EDU 
Date: Tuesday, February 23, 1999 7:56 PM
Subject: Etching Mask for BSG(Corning 7740)?


>
>hi, Everybody:
> I am trying to etch microchannel on glass (borosilicate glass,7740),
>but, lack of the support to do LPCVD poly-silicon on glass, the only
subsitution
>I know is Cr/Au, but I really don't know if it can resist deept etching for
me,
>about 320 mu m...
> Besides, I don't know if amorphous silicon can resist to HF etching,
>I want to do deep etching, so I will use HF about 48% solution...
> Any suggestions will be granted! I will appreciate..
>
> Thanks a lot,
> Sincerely
>
>Jerry Lee
>Insitute of Applied Mechanics
>email: r6543023@gauss.iam.ntu.edu.tw / iamjhlee@email.com
>
>
>