I am looking for CVD equipment for Poly Si, Low Stress SiN, and
sacrifical SiO2 layers. I am aware of and have worked with LPCVD tube
furnaces, but I was hoping that there was a newer way to deposit these
types of films (PECVD isn't hot enough for the types of films we want,
I've worked with these too).

 Tube furnaces are not really what I am looking for because we are an
academic facility, so we would like only a one or two wafers coated, not
25 to 50. Also tube cleaning and  gas usage are much larger issues than
I would like to deal with. So, I was wondering if anyone has developed
something better.

If you know a technology and a supplier, please let me know.

     Ken Westra
     MicroFab at the University of Alberta
     westra@amc.ab.ca