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Thank you for the replies regarding masks for KOH etchant.

I also forgot to mention in may first posting that I am trying to stay
away from the standard processes based on oxide or nitride masks.

Nickolay
--
Nickolay Lavrik
University of Tennessee
Department of Chemistry
420 Buehler Hall

Ph.(865) 974-6174


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From: "Michael Whitley" 
To: "Nickolay Lavrik" 
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Subject: Re: photoresist for KOH etching
Date: Tue, 11 Apr 2000 17:03:09 -0500
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You'll probably have to use silicon nitride or silicon dioxide to mask the
KOH etch.  Nitride is the best, but oxide will serve well if it is thick
enough.  There should be plenty of information in the literature.
----- Original Message -----
From: Nickolay Lavrik 
To: 
Sent: Monday, April 03, 2000 11:48 AM
Subject: photoresist for KOH etching


> Any information on photoresists that reliably protect Si during deep KOH
> etching will be highly appreciated.
>
>
> --
> Nickolay Lavrik
>
> University of Tennessee
> Department of Chemistry
> 420 Buehler Hall
>
> Ph.(865) 974-6174
>
>
>
>


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