Aluminum fluoride is not volatile a room temperature, Aluminum chloride is.

        -K

----------------------------
Kevin A. Shaw, Ph.D.
Senior Engineer
Kionix Inc.
22 Thornwood Dr.
Ithaca, NY 14850
Phone: (607) 257-1525, x125
Fax:   (607) 257-1612
Email: kshaw@kionix.com

> -----Original Message-----
> From: Jay Mirza [mailto:jm7716@cnsvax.albany.edu]
> Sent: Friday, May 05, 2000 1:14 PM
> To: MEMS@ISI.EDU
> Subject: why not use flourine based chemistry to etch Al
>
>
> Hi guys,
>
> why chlorine based chemistry is preferred over lets say fluorine to etch
> Al in plasma etch (RIE type)?
>
> any help would be useful.
>
> thanks
>
> Jay Mirza
>
>