Do you want a negative working photoresist or a photoresist with the
physical and chemical properties associated with a negative photoresist?
If it is the first, you can chemically treat positive resist to give a
negative working resist that can resolve 0.125 um lines and spaces. See
my paper in Applied Optics, vol. 27, 1377-1380 (1988). Since that work
was done, AZ5200 became available. This resist makes the process easier,
but I do not know what resolution has been demonstrated.

Winston

Vardit Eckouse wrote:
>
> Hello everyone,
>
> I am interested in a negative photoresist for direct writing with a HeCd
> 442nm laser with submicron resolution. I have no idea where I can find a
> photoresist like that.  All your infromation will be highly appriciated
> Thanks in advance
>
> Vardit Eckhouse
>
>

--
Winston Chan                            | phone: (319) 353-2398
Dept. of Electrical Engineering         | fax: (319) 353-1115
University of Iowa                      | email: winston-chan@uiowa.edu
Iowa City, IA 52242