Dear Mems people

I am trying to perform a second photolithography step on islands which I
have etched to a height of 20 to 40 microns.  Unfortunately I am finding that
my photoresist seems to runn off and end up in puddles at the bottom of the
islands and much too thin on the top (or not at all)

I was thinking of spraying on my photo resist instead of spinning.  Has
anybody
tried this??  Can anybody suggest another way to avoid this problem.

cheers


Olly Powell
School of microelectronic engineering
Griffith University
Australia