Dear all,

I am trying to use the new photoresist of Clariant: AZ 9260 for
achieving high structures, typically around 80 to 100 microns by a
multilayer process. We are using an hotplate for the prebake. However,
cracks appear after the exposure.
Does anyone have a special receipe for this photoresist which could lead
to a low stress layer?

Thanks a lot in advance for your answers,

Magali Brunet

--
PEI Technologies,
NMRC, Lee Maltings, University College,
Cork, Ireland.

Tel: +353 21 4 904279
Fax: +353 21 4 270271
email: mbrunet@nmrc.ie