Dear MEMS researchers,
We would like to etch TiSi2 deposited on a SiO2 layer. We tried HF but it is
problematic because the silica layer is etched too.
Does anybody has a solution (wet or dry?)

Thanks,

Nicolas.

-----Message d'origine-----
De : Jiangang Du(John Duke) [mailto:jxd77@po.cwru.edu]
Envoyé : mardi 17 avril 2001 16:33
À : MEMS@ISI.EDU
Objet : RIE


Hi,pal:
Who can tell me where I can find service to reactive ion etch by
100W,6sccm oxgen gas plasma? Service near Cleveland is preferred.
--
Regards,
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John Duke
EECS Dept.
Case Western Reserve Univ.
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