I'm working on electron beam lithography, and I need to use PMMA as a mask for
plasma etching of Ti and SiO2.
Can anybody suggest me a recipe for this two dry etchings, and in particular
the conditions for PMMA (950K) hard bake?
Thanks to all,

                      Erica Bennici

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Erica Bennici
Dipartimento di Fisica
Politecnico di Torino
C.so Duca degli Abruzzi, 24
10129 Torino, Italy
tel +39 011 564.7381/564.4160
fax +39 011 564.7399
E-mail : bennici@polito.it
 http://www.polito.it/centri/laborato/limadel/film/tfg.htm
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