Hello,

LOL2000 and LOL1000 from Shipley can create the profile that you need.  it
requires using another resist on it. it is used as a liftoff layer
frequently.

oray orkun cellek
o.o.cellek@ieee.org
METU-Ankara, Turkey

----- Original Message -----
From: "3k
To: 
Sent: Monday, November 26, 2001 2:04 PM
Subject: [mems-talk] [Q] developing photoresist to form an angle


> [IMAGE] Hello
>
> I want to develop photoresist to form an angle.
> The bottom of the open space(developed part) must be
> larger than the upper part of the open space.
> In other words, the 'entrance' of developed hole must
> be narrower than the bottom side.
>
> like this,
>
> --------- ------------
> pr / ` pr
> ---------------------------
> wafer
>
> If there's anybody who knows the way, tell me please.
> Thanks.
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