Hi, Maybe you should try electro plating for such thicknesses, Good luck, Bruno At 17:48 16/12/2001 +0200, you wrote: >Hi All, >I am trying to deposit 20 microns of Aluminum in Evaporation or in >Sputtering. >However, the film is very stress (more stress in sputtering). >Do you know a way to reduce the stress for such films? > > >My Best Regards, >Lior Grossman; Sales Manager >B.G. Technical Support Ltd (www.bg-tech.co.il) >_______________________________________________ >mems-talk@memsnet.org mailing list: to unsubscribe or change your list >options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk >Hosted by the MEMS Exchange, providers of MEMS processing services. >Visit us at http://www.mems-exchange.org/ > *********************************************** * * * Dr Bruno Wacogne * * Laboratoire d'Optique P.M. Duffieux * * Faculti des Sciences et des Techniques * * Route de Gray * * 25030 Besangon cedex * * * * tel (++33) 3 81 66 64 25 * * fax (++33) 3 81 66 64 23 * * mel bruno.wacogne@univ-fcomte.fr * * * * http://imfc.univ-fcomte.fr/lopmd/index.html * * http://imfc.univ-fcomte.fr/ * * * ***********************************************