"MEMC Etch-A Chromium Trioxide-Free Etchant for Delineating Dislocations and
Slip in Silicon" Journal of the Electrochemical Society, Solid-State Science
and Technology, March 1990

(Sorry if the reference format is non-standard)

Thanks for your interest,

A.G.

-----Original Message-----
From:   mems-talk-admin@memsnet.org [mailto:mems-talk-admin@memsnet.org] On
Behalf Of Victor Lifton
Sent:   Thursday, January 10, 2002 10:32 AM
To:     mems-talk@memsnet.org
Subject:        Re: FW: [mems-talk] Non-Chromium Trioxide Defect Etch

Would you please send me a reference to that MEMC
paper.
Thank you,
VL

> -----Original Message-----
> From: mems-talk-admin@memsnet.org
> [mailto:mems-talk-admin@memsnet.org]On
> Behalf Of Art Glidden
> Sent: Thursday, January 10, 2002 8:20 AM
> To: mems-talk@memsnet.org
> Subject: [mems-talk] Non-Chromium Trioxide Defect
> Etch
>
>
> Looking for a non-CrO3 etch for finding dislocation,
> slip, and stacking
> fault defects in 100 Si slices. I've read a 1990
> paper on an etch employing
> Copper Nitrate, developed at MEMC. Experience using
> that, or other, more
> user-friendly etchant for this purpose?
>
> A.G.
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