Comparison between AutoCAD and Coventor's Layout Editor I am the Product Manager for the Front-End Tools of CoventorWare so admittedly I have a bias towards the Layout Editor in Coventorware. However, I've tried to be as objective and accurate as possible in the following comparison. At Coventor, I've personally worked with customers who use AutoCAD for mask design and we've been able to successfully integrate their AutoCAD layouts with our analysis tools. I only point this out to show that we don't have a problem working with AutoCAD alongside Coventorware. However, we do feel that the Layout Editor in CoventorWare provides some unique capabilities that make it a better choice for MEMS layout. Unique features of each package: CoventorWare Designer (stand-alone layout component) Created from the ground-up for MEMS layout. Able to import GDS, CIF, DXF; export GDS, CIF Creates only objects acceptable to mask makers: closed objects, no zero-width wires. Extracts 2D layout from parameterized MEMS schematics (behavioral models) Generators: Predefined foundry elements, parameterized electromechanical elements, and custom user-defined generators Integrated 3D Solid Model builder: fabrication process editor, along with layout description, is used to create solid model (all included) 3D visualization, including arbitrary cut-planes, of solid-model, conformal layers, angled sidewalls, etc. Optionally integrated into larger MEMS analysis suite for building full-3D and reduced-order models, and performing physics analyses Runs on both Unix and Windows platforms AutoCAD Strong selection and object manipulation capabilities: Very easy to align and move, using object snaps. Mature software: 16 versions released, thus many pluggable modules available Strong mechanical design environment well suited for some MEMS Both Hierarchical design ('cell-' or 'block-based') Unrestricted layer definitions capability Both graphical and command-line interfaces, for scripting (Designer's is Java-based) True curves and true rotations of all objects Regards, Tim Tsuei > Date: Sat, 5 Jan 2002 12:58:09 -0800 (PST) > From: Siripon Sukuabol> To: mems-talk@memsnet.org > Subject: [mems-talk] Which the best is between Autocad and 2D-Catapul mask > layout in > Coventor for MEMS Design? > Reply-To: mems-talk@memsnet.org > > Dear All; > > > Could you tell me which the best one is between > Autocad and 2d-catapul mask layout in Coventor ? > > > How are they different? > > Thank you > > Siripon > ----------------- ----------------------------- Tim Tsuei, Ph.D. Product Manager: Front-End Tools Coventor, Inc. (formerly Microcosm) 4001 Weston Parkway, Suite 200 Cary, NC 27513 http://www.coventor.com ----------------------------- [demime 0.98e removed an attachment of type application/ms-tnef which had a name of winmail.dat]