Try using AZ9260 photoresist from Clariant Corporation.
Rohit

-----Original Message-----
From: mems-talk-admin@memsnet.org [mailto:mems-talk-admin@memsnet.org]On
Behalf Of BobHendu@aol.com
Sent: Monday, February 18, 2002 11:36 AM
To: mems-talk@memsnet.org
Cc: xanh@processintegrationll.com
Subject: [mems-talk] Positive resists for MEMS processing


We have recently begun processing wafers using a new plasma system for doing
deep silicon etch. Since our goal is 100 microns of vertical etch profile in
silicon we are interested in what types of positive photoresists MEMS people
are using. Our initial results with standard positive resist at thicknesses
of around 1.2 microns have not yielded very consistant results. Work that we
have done with SU-8 resist have been very good with respect to profile and
depth of etch using a formulation of around 5 microns thickness. This also
allows us to ash off the SU-8 after etch with little problem. My question is
what type of resists are acceptable within the MEMS community that will
yield
at least a 4-5 micron thickness with vertical profiles using stepper or
other
alignment tools. Bob Henderson
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