what is your enchant and how slow.

-----Original Message-----
From: Ravi Shankar [mailto:shankar@sclchd.co.in]
Sent: Monday, March 11, 2002 12:43 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Etch release of SiNx


Hi all,
 i have been using a oxide etchant to release a SiNx structure by etching
away a doped oxide, but the
lateral etch rate is quite slow. i have not used any agitation for the
fear of sagging the microstructure. The SiNx also is getting etched in the
mean time(around 30 min).
could somebody please suggest something to over come the problem.
thanks
regds
Ravi Shankar
Semiconductor Complex Ltd,
India
_______________________________________________
mems-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/