Hi, One solution could be a simple capacitive plasma generator. With this sort of equipment you have a R/D tool that can plasma treat with a variety of gasses. With 02 you get a better clean than U.V. ozone generated cleaning, and the option to add different gasses for R/D exists. For example with CF4 or SF6 you can etch Silicon in all its forms. With a H2 containing gas you can reduce oxides and clean copper, silver and aluminum. How fragile are your samples. My company manufactures a capacitive plasma system which I can supply details off and I can get samples run. A capacitive plasma system creates the plasma between the plates of a capacitor and as such gives great uniformity in a plane parallel to the electrodes. Bill Moffat -----Original Message----- From: SOOJIN OH [mailto:sjoh@physics.unc.edu] Sent: Monday, March 11, 2002 11:16 AM To: mems-talk@memsnet.org Subject: [mems-talk] [Q]surface cleaning Hi, I need some surface cleaning equipment to clean the surface of regular cover glass without damaging it. I wanted to buy "UV-CLEAN" manufactured by Boekel industries, Inc, but found out they stopped making that model. Would anydoby please suggest any other manufacturers of similar products? Or some better ways to clean glass? My purpose is to increase wettability by removing organic contaminants, and my samples are very fragile. Thank you very much for your kind answer. ----------------------------------------------------------------------------- -- Soojin Oh Graduate student in Otto Zhou's group Rm 163 Phillips Hall (phone)919-962-3525 (fax) 919-962-0480 ----------------------------------------------------------------------------- -- _______________________________________________ mems-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/