Hi Frank
We use AZ4562 as mask for Si-deep etching in a STS ICP system.
The thickness is about 10 microns using 700rpm 5sec followed
by 1700 rpm 35 sec.
Greetings
Stefan

_____________________________________________________
Dr. Stefan Blunier
ETH Zentrum, CLA G 21.2
Institut fuer Mechanische Systeme
Tannenstrasse 3
CH - 8092 Zuerich
Switzerland

Tel:   +41 1 632 77 64
Fax:  +41 1 632 11 45
e-mail: blunier@imes.mavt.ethz.ch
__________________________________________________


-----Original Message-----
From: BERAUER,FRANK (HP-Singapore,ex7) [mailto:frank_berauer@hp.com]
Sent: Donnerstag, 14. Mdrz 2002 07:10
To: 'mems-talk@memsnet.org'
Subject: [mems-talk] Thick Photoresist Materials/Applications


Dear Fellow MEMS Researchers,

I am interested in thick (>10um) photoresist materials (other
than SU-8) and applications. If you are working with those or
know a good source of information, please let me know. Thanks!

Greetings,
        Frank Berauer
        Senior R&D Engineer
        Hewlett-Packard Singapore

P.S.: I would like to express my gratitute to those who make
        this discussions possible, sift through hundreds of
        messages promptly and help to keep the group focused
        and free of spam. (Is it you, Andrew M. Kuchling?)
        It is a great job to all of us and I think you deserve
        more than praise. If you ever come to my part of the
        world, let me know and you're in for a Chinese seafood
        treat (fellow MEMS researchers in Singapore are welcome
        to join!).
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