Dear fellow MEMS Researchers,

in a previous question I asked for a fraktal Gold Surfaces. Now I'm
experimenting

with black silicon, what I'm producing in a RIE-Process (SF6 & O2). But the
average

Roughness of this black silicon is too low - mainly if I sputter Ti/Au on
it. Has anyone

an idea to increase the roughness? Which parameters can I use?

Greetings,

Thorsten Uelzen

Department of Microsystemtechnology

Technical University Hamburg-Harburg

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Thorsten Uelzen
Technische Universitdt Hamburg-Harburg       fon: (+49) 40 42878 2397
Mikrosystemtechnik (AB 4.07)                     fax: (+49) 40 42878 2396
Ei_endorfer Stra_e 42                                 email:
uelzen@tu-harburg.de
D-21073 Hamburg                                       www:
www.tu-harburg.de/mst
Germany