I have had success etching Nb with pure SF6 plasma using a March Jupiter RIE
system.  The electrode diameter was ~ 6".  RF power was 50 watts.  Pressure
wass 200 mTorr (?).

1.3 microns of hard-baked resist was more than adequate as a mask to etch 4000
Angstroms Nb films.

Roger Shile

>>> mike.tippetts@pfe-ltd.com 04/18/02 03:34AM >>>
Hi all,

I have been trying to etch Niobium using CF4 plasma but the process seems more
willing to strip
the photoresist before it etches into the metal. Does CF4 have problems with
selectivity or is there
another recipe for this process that could be used.

Mike
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