Mathieu,

I agree with Gabriella, SU-8 is not etched as such by KOH, but it is severly
attacked. It will simply degrade, and detach from the substrate.

Regards,

Kevin Banks


>From: arles@elec.gla.ac.uk
>Reply-To: mems-talk@memsnet.org
>To: mems-talk@memsnet.org
>Subject: [mems-talk] Re: SU8 in KOH bath
>Date: Thu, 18 Apr 2002 19:21:45 +0100 (BST)
>
>Hi Mathieu,
>
>SU8 will survive the KOH, but it will come off from your silicon during the
>process. I don't think it is an option.
>
>Best regards,
>Gabriela Juarez-Martinez
>Dept. Electronics
>University of Glasgow
>Glasgow G12 8LT
>
> > Dear MEMS society,
> >
> > I want to protect some alignment marks with SU-8 to etch poly-Si in a
> > KOH
> > bath. What happens with SU-8, is it etched? What's the etch rate?....
> >
> > How can I protect these alignment marks in poly-Si in the KOH bath?
> >
> > Thank you for your answer
> >
> > Regards
> >
> > Mathieu
> >
> >
>-----------------------------------------------------------------------------
> > --
> > Mathieu Burri
> > Sensors, Actuators and Microsystems Laboratory
> > Institute of Microtechnology
> > University of Neuchbtel
> > Rue Jacquet Droz 1
> > CH-2007 Neuchbtel
> > Switzerland
> > Tel: +41 32 720 52 78
> > Fax: +41 32 720 57 11
> > E-mail: mathieu.burri@unine.ch
> > Internet: http://www-samlab.unine.ch
> >
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