RIE will affect the underlying silicon since etch selectivity usually is
~1:1. There will some etching of the silicon, which may roughen the surface.
-Mike Pedersen

Haigh, Richard wrote:

> Dear All
>
> I've had some SOI wafers coated with Si3N4 and patterned on one face.
> Unfortunately, the wrong face has been patterned. I don't want to
> dispose of the wafers because of their cost. I've been told that I can
> have the nitride striped off both faces (with RIE), then re-applied and
> patterned on the correct face. What I need to know, does the stripping
> damage the silicon in anyway?