Try 1HF: 40 H20 : 1 H2O2 at room temp. though of course this will etch
oxide as well.

-Mike

>>> aglidden@bullen-ultrasonics.com 04/22/02 01:47PM >>>
Looking for information about a "TI" etch for finding defects in
silicon
crystal. This was recommended as an effective, non-chromium etching
process
for this purpose.

Thanks in advance for the help,

Art
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