Does anyone have advice for removing PGMEA from films of photoresist
(here, SU-8) using supercritical CO2? I'd like to bypass an exchange
with isopropanol, if possible, but I don't have any idea how much I will
need to wash the films with liquid CO2 to remove the solvent.

The films are about 10 microns thick with a feature size of about 300nm.

Regards,

Chris Blanford

--
Christopher F. Blanford
Inorganic Chemistry Laboratory, South Parks Road, Oxford, OX1 3QR, UK
Phone: (44)/(0)-1865-282603; Fax: (44)/(0)-1865-272690
PGP keyID: 356CC429  http://pgp.ai.mit.edu/