My favorite is a 1::3 ratio of Ammonia Hydroxide and Hydrogen Peroxide (30%).
It works well on both Ti and TiW (1kA-3kA/min).

  Anke Stock  wrote: Hello to everybody,
is there someone who has experience in wet etching of TiW? I use a
mixture of HCl and H2O2, but it seems that there are small amounts of
TiW on the wafer after etching. Has someone experiences with parameters
like temperature, time, other mixtures or something else? Many thanks
for your help
Anke
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