Hi,
I want to use bosch to fabricate my structures for vertical sidewalls. I
have an ordinary RIE system. And I plan to use SF6+He to etch silicon and
CF4+H2 to form the sidewall passivation polymer. And I am going to use
photoresist as the mask during etching. The thickness I needed is about 8
microns.
Because I don't have any experiences of bosch etching, any suggestion will
be very helpful. And I really need some point to start with.
Thanks a lot!

Peng Yao
DOEs lab
Electrical Engineering Dept.
Univeristy of delaware
Newark D.E 19716