Tom---
You may consider VectorWorks. Its a fullfledged 2-D and 3D cad program. I
have not had problems importing a few AutoCAD files (have only tried this
once). The latest version (9.5.1 I think) is very well designed and is fully
native in Mac OS X, and seems to be well supported by the company.
I also use Adobe Illustrator when doing lower resolution masks, and output
to a film printer (linotronic).
Good luck -chris
--
Christopher Khoury Nanosphere, Inc.
Microsystems Engineer 1818 Skokie Blvd. Suite 200
ckhoury@nanosphere-inc.com Northbrook, IL 60062
W:(847)656-0240 F:(847)562-8886
On 5/1/02 6:44 PM, "Tom Metcalf" wrote:
> Hello,
>
> Has anyone successfully designed photomasks on a Macintosh? I know I
> need to make either .dxf or GDS files. For GDS, the only option is
> dw-2000 (and the lite version), which I'm looking into, but is extremely
> expensive and probably overkill for the simple MEMS work I'll be doing.
> The most popular option, it seems, for those who don't want to buy a
> program like dw-2000 is AutoCAD, but there is no Mac version of this.
>
> There are several of Macintosh CAD programs, and even something like
> Canvas claims it can save .dxf files. But I don't really believe
> publisher's claims of AutoCAD compatibility, especially for .dxf -> GDS
> or .dxf -> pattern generator machine code stuff.
>
> So what software has anyone successfully used to design photomasks on a
> Macintosh?
>
> --Tom Metcalf
>
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