durusmail: mems-talk: Contact Angles of Semiconductor Films
Contact Angles of Semiconductor Films
2002-05-03
2002-05-06
Contact Angles of Semiconductor Films
Bill Moffat
2002-05-06
Tariq,
      I have personally worked on a number of papers that discuss contact
angles for semiconductor processing.  I am just down the road, close to the
Milpitas border and would like to discuss with you the action of plasma and
silanes as contact angle control processes. Having manufactured HMDS primers
for over 20 years and plasma surface modifiers for over 15 years we have lots
of experience with contact angle measurement.  Bill Moffat  408 954 8353

-----Original Message-----
From: Tariq M. Haniff [mailto:thaniff@genospectra.com]
Sent: Friday, May 03, 2002 11:14 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Contact Angles of Semiconductor Films


Dear Members,

I am looking for a good summary of hydrophobicity/hydrophilicity of films
compatible with semiconductor processing.
Films like, thermal oxide, LTO, BPSG, Si3N4, etc. Specific contact angle
would
be great. Can anyone point me in the right direction?

Thanks in advance,

Tariq M. Haniff
Genospectra, Inc
6519 Dumbarton Circle
Fremont, CA 94555
510-818-2600
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