Bo,
   What size pillars and what material.  I have a paper on producing pillars
in Photoresist that are 0.5 microns diameter and 1.2 microns high.  Using
image reversal the angle of the side wall can be varied +/- 10 degrees from
vertical with ease  In the case of this paper the author wanted vertical side
walls.  Then flowing TEOS around the reversed image photo resist he defined
contacts with vertical side walls and increases the speed of his devices 40%
and decreased the size by 60%.  let me know if this process can help.  Bill
Muffed

-----Original Message-----
From: Bo He [mailto:hezhenbo@hotmail.com]
Sent: Thursday, May 16, 2002 9:50 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] PDMS pillar shape


Dear All:

         I am working on making pillar arrays by PDMS. But when I pull
out PDMS from SU8 mold, I found most pillars were deformed (bent). The
reason I am thinking about is that the cavity on SU8 mold has positive
slope hence PDMS pillar has negative slope. The the top of PDMS pillar,
which is in contact with the bottom of the cavity on SU8 mold, is larger
then the bottom, so it's deformed or bent during pulling out. Is there
anyway to solve the problem? Any suggestion is highly appreciated.

Bo

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