Hi, folks
I want to etch 80um width 40um depth channel on Pyrex 7740 glass wafer.We
succeed using 20nm Cr+ 200nm Au metal mask to get this channel. I read some
post, it seems just 1000A Cr should be enough to get such kind dimension
channel on the glass. Anyone has the similar experiences? please comfirm
this for me.

Thanks at advance.
Dlee

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