Dear all, I do strongly second Marc's explanation. Those of you who've been to the MRC sputter school will have seen SEM pictures of this effect. I personally tried to sputter 5000A of gold recently onto thermal oxide wafers of controlled temperature. Even with a film this thick, coalescence (de-wetting) starts as low as 200 C and the film is non-conductive at 300 C, or peels off right away The only way is to use a wetting/adhesion layer. I never tried annealing at 700C , but Au diffusion into oxide definitely is a concern, so your wetting layer should also be a good diffusion barrier. hope this helps klaus (TEEL) Tokyo Electron Europe Limited PVD Process Support (ex MRC) Klaus Beschorner Tel +49-7033-45683 Drosselweg 6 Fax +49-7033-45631 71120 Grafenau, Germany Mobile +49-174 315 7754 >Allow me to add to my original answer. I am quite sure this is what is >happening, though I am a little surprised that it would occur for a >1000 >angstrom film. Gurvinderjit- are you sure of this thickness? > >I used to make a form of tunneling sensor just this way- depositing >300-500 >angstrom gold films on a glass slide, then heating the suface until the >uniform gold film broke apart and migrated to form discrete but closely >spaced "islands". I then filled the space in between with one of >several >organic semiconducting films to enhance the tunneling efficiency as >they >were exposed to various VOC's. > >Hope this helps. > >marc > > > -----Original Message----- > From: Marc Straub [mailto:marc.straub@coventor.com] > Sent: Monday, May 20, 2002 10:17 AM > To: mems-talk@memsnet.org > Subject: RE: mems-talk digest, Vol 1 #291 - 7 msgs > > > Gurvinderjit, > > I suspect that your film is "beading" like water on a waxed > surface and forming into discrete gold islands. Gold does not > wet or adhere to oxides well, particularly in very thin layers. > Heating the surface gives the Au atoms the energy they need to migrate. > > Depending upon your application, you should try a thicker layer > and/or flashes (thin layers) of Cr/Cu, Ti or Ti/W under the Au > for better adhesion. Good luck. > > -- > Marc Straub > Staff Engineer, Product Development Services > Coventor, Inc. (Formerly Microcosm Technologies) > 7 Corporate Park, Suite 260 > Irvine, CA 92606 > Ph: 949-756-0033 Fax: 949-756-0070 > marc.straub@XXXXcoventor.com [remove the "XXXX"] > > > > -----Original Message----- > > Date: Mon, 20 May 2002 11:20:15 +0530 (IST) > > From: Gurvinderjit Singh> > To: mems-talk@memsnet.org > > Subject: [mems-talk] Gold film > > Reply-To: mems-talk@memsnet.org > > > > Dear friend i have one query. > > I am depositing gold film (thickness 0.1 micron)by thermal > evaporation on > > oxides, > > but when i am annealing my sample to 700K this gold film become non > > -conductive may be duo to formation of gold oxide. But from > > literature i found > > that gold should not become oxide till 1200K. I also read people using > > gold electrodes (thin film by thermal evaporation) on their samples and > > work till 900k kindly let me know where i am doing mistake, > wether to take > > more thick film or something else.