Mehmet, Do not know if a vacuum vapor prime will withstand a 3 hour HF process. With aluminum we have found that a longer prime time is needed to reach the lower number of Hydroxyl ions on a metalized wafer. I would be happy to run a matrix of prime time experiments for you if you have wafers to spare. Again let me reiterate, after a, vac vapor prime, the wafer is sealed against attack of moisture and can withstand a very long up to 8 weeks exposure to outside atmosphere. Bill Moffat -----Original Message----- From: Mehmet R. Dokmeci [mailto:mehmetd@engin.umich.edu] Sent: Monday, May 20, 2002 6:22 AM To: mems-talk@memsnet.org Subject: [mems-talk] Adhesion layers that can withstand a 3 hour HF release hello everyone: I am working on a surface micromachined device with an exposed Au layer. I was wondering if anyone knows of a low stress adhesion layer that can withstand a long (3 hours+) HF release process. Any papers and any pointers are truly welcome, Thanks, -Mehmet ps: MUMPS handbook uses Cr/Au however their soak times are much shorter. _______________________________________________ mems-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/