Hello

I am having a rather difficult time trying to deposit a 200nm layer of
titanium onto silicon.  Occasionally it works nicely,  but the rest of the
time I get a thin brightly coloured layer of some enchanted material of
mystery.

I am spluttering at room T (But I tried higher T also) with 150mW DC and
about 4mBar Argon Pressure.  Has anybody experienced this before?


Thanks

Olly Powell
School of Microelectronic Engingeering
Griffith University
Australia