Hi Martin,

You can use a UV-Ozone Cleaning process to remove the remaining 100-500 nm
of polyimide. Please visit our Web site at
http://www.samcointl.com/prod/UVO.html for our line of UV-Ozone Cleaners
and contact me if you have any questions or would like to receive
additional information. I look forward to helping you with your
application.

Shahram



Martin HEDSTROM wrote:

> Hi all,
>
> I have a problem with removal of polyimide residues under a nitride
> membrane. The polyimide is removed in a pure O2-plasma since I am afraid
> that any CF4 addition might hurt the nitride membrane. Apparently this
> O2-plasma is not sufficient since I get small residues left with about
> 100-500 nm thickness.
>
> Does anybody know about any dry etchant which can remove the last of the
> polyimide without damaging the nitride membrane?
>
> Thanks in advance
>
> /Martin
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