Dear Bob.
I am trying for a long time to develop a RIE recipe of nitride with high
selectivity to oxide. Can you suggest me for such a recipe?
Thank You.
________________________________________________________________________
_________
______________________
Mark Schvartzman
Process engineer
GWS Photonics Inc.
Paz Towers, 33, Bezalel st.
Ramat-Gan, 52581, Israel
Tel. 972-3-7534440
Cell. 972-51-722389
E-mail: mark@gws-photonics.com


-----Original Message-----
From: BobHendu@aol.com [mailto:BobHendu@aol.com]
Sent: Tuesday, June 25, 2002 4:00 PM
To: mems-talk@memsnet.org
Subject: Re: [mems-talk] SIN etching


Have you considered rie etching the SiN? The results should be very
acceptable with selectivity to the underlying oxide around 5:1 using a
fluorine plasma. bob henderson
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