Phil,
     Possible commercial, possible information.  To the best of my knowledge,
when you create a plasma you break apart a molecule of gas into Ions and
Electrons.  the gas is now conductive and can now receive electrical energy
which causes the energy level of the electrons and the ions to increase.  the
ions get physically hotter and vibrate and the when it meets your wafer is
translated into physical energy that scrubs the resist off.  In addition the
Oxygen being hot, and a large amount of the gas has not been changed to ions
and electrons, oxidizes the resist.  The Ion is almost as large as the
molecule and acts like the molecule, think of it as being a slow bumbling
piece of gas.  the electron is very light and absorbs the electrical energy by
moving faster, almost at the speed of light.  This allows the electron to
diffuse into your wafer and if you have an MOS some of the electrons diffuse
into the gate and cause the SiO2 gate to become more and more conductive.  A
way to reduce this is to use down stream plasma, this reduces the level of
electrons being produced in the vicinity of the device.  A way to remove this
effect totally is to use down stream charge grounded plasma.  A grounded grid
is placed down stream from the plasma production which grounds out the
electrons.  The big bumbling ions for the most part do not deviate and proceed
on to create a glowing plasma of hot Oxygen and glowing Oxygen Ions.  Contact
me for more details Bill Moffat

-----Original Message-----
From: phil.lau@baesystems.com [mailto:phil.lau@baesystems.com]
Sent: Thursday, June 27, 2002 9:00 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] PLASMA CHARGE DAMAGE to CMOS/MEMS?


Hello,
        As an experiment, or unintentionally, has
anyone encountered PLASMA CHARGE DAMAGE to their CMOS
CHIPS (fully fabricated) when a MEMS Structure,
along-side the CMOS Circuit, IS BEING RIE PLASMA ETCHED?

I would appreciate some form of feedback. If the answer is yes, and a
paper has been written about the experience, please let me know.

Thanks,

Phil



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