Dear K.C.Mohite

We have some results for SiOxNy deposited by PECVD and optomechanical
characteristics (residual stress versus refractive index).
  a.. S.S. Lee, M. Jszwik, A. Sabac, C. Gorecki "Study of internal stress
characteristics of optical quality silicon oxinitride thin films fabricated
by plasma-enhanced chemical vapour deposition", pp. 242-246, Mechatronics
2001, 5th Franco-Japanese Congress & 3rd European-Asian Congress, Besangon
(France), October 9-11, 2001

  b.. C. Gorecki, A. Sabac, M. Jszwik, S.S. Lee, "Characterisation of
internal stress of silicon oxinitride thin films fabricated by
plasma-enhanced chemical vapour deposition: applications in Integrated
Optics", Proc. SPIE Vol. 4596, pp 9-15, 2001.


  c.. M. Jszwik, C. Gorecki, A. Sabac, "Optical interferometry investigation
of internal stress and opto-mechanical characteristics of silicon oxynitride
thin films fabricated by PECVD", Symposium on Design, Test, Integration and
Packaging of MEMS/MOEMS, Cannes Mandelieu, France, 5-8 Maj, Proc. SPIE Vol.
4755, pp 760-764, 2002.
  Best regards

  Michal Jozwik




----- Original Message -----
From: "kakasaheb chandrakant mohite" 
To: 
Sent: Friday, June 28, 2002 8:16 AM
Subject: [mems-talk] Silicon oxynitride optical properties


> Dear friends,Dear MEMS colleagues
> I have deposited Silicon oxynitride thin films by
> EB-PVD.I would like to know the dependence of
> substrate temperature on compositional and optical
> properties (particularly refractive index and
> reflectance) of these films.
> Can someone point me to sources where optical
> properties of SiOxNy can  be checked?
>
> Thanks
> K.C.Mohite
>
> =====
> **********************************************************
> K.C.Mohite                          Ph.9120-5695201(O)
> School Of Energy Studies               9120-7291872(R)
> Department of Physics
> University of Pune
> PUNE-411 007
> INDIA
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