Hi,

You may need to clean your wafer surface better before you
put resist on. Polymer might be the cause for non-sticking
surface.
Good luck,

Fan

-----Original Message-----
From: Balaji Lakshminarayanan [mailto:lakshmin@eng.usf.edu]
Sent: Wednesday, July 03, 2002 5:04 AM
To: mems-talk@memsnet.org
Cc: mems-talk-admin@memsnet.org
Subject: [mems-talk] Problems with liftoff(on quartz)


Hi,

I am having problems with developing photoresist on quartz wafer. The
photoresist is not sticking to the quartz. Has anyone experienced similar
problems. In particular, with AZ 5214E which i want to use for patterning
metal using liftoff. The procedure that i followed is

a) 1.50 HF dip for 15sec
b) spin-on HMDS+AZ5214
c) soft back @ 90C/60sec
d) Expose for 8sec
e) Hard bake for 110C/45sec
f) Flood expose for 85sec.

I followed the above procedure on glass and it worked well. Any help on the
same will be appreciated

thanks

bala
_______________________________________________
MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us
at http://www.memsnet.org/