Hi Hongjun Zeng!

Try the AZ9260 photo resist, quite a bit better in aspect ratio and plasma
resistance, to be developed in AZ400K (best: 1:4) developer.
You can easily strip it with acetone.

But be aware: Only good for positive image. No image reversal possible. But
since your AZ45xx can't be reversed either, this might be the right resist for
you.

Regards
Dirk Grobe

----------------------------------------
Gesellschaft f|r Diamantprodukte mbH, Ulm
Company for Diamond Products Ltd., Ulm, Germany
  fon: +49(731)505-4546
  fax: +49(731)505-4561


> -----Original Message-----
> From: hzeng [mailto:hzeng@ece.uic.edu]
> Sent: Tuesday, July 02, 2002 10:12 PM
> To: mems-talk@memsnet.org
> Cc: mems-talk-admin@memsnet.org; Hongjun Zeng
> Subject: [mems-talk] AZ4562 or other thick photoresist
>
>
> Dear Collegues,
>
> Could you help me to reach the answer of following questions,
>
> 1. Where can I get the AZ4562 photo resist, especially in US?
> 2. Is there any extreme thick photoresist else which can be
> easily removed by chemical liquid such as acetone?
>
> Thanks for your attention,
>
> Hongjun Zeng
> Microfabrication Applications Laboratory (MAL)
> University of Illinois at Chicago
> ERF Building, 842 W. Taylor Street
> Chicago, IL 60607-7022
> Room 3014 ERF
> Tel.: 312-413-5889, Fax: 312-996-6465
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