durusmail: mems-talk: RE: AZ4562 or other thick photoresist
RE: AZ4562 or other thick photoresist
2002-07-03
2002-07-08
RE: AZ4562 or other thick photoresist
Hong Qiao
2002-07-03
Hi,

if you can reach SJR 5740, you can get 20um thickness under the following
process.

1. spread 10s 200rpm
2. spin     15s 1500rpm
3. let substrate sit on the chunk for 5 min
4. softbake 6min 105C
5. expose 18s
6. develop 8min (microposit 354)

it need the humidity of environment higher than 40%.

Hong

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